http://rdf.ncbi.nlm.nih.gov/pubchem/patent/KR-20080007355-A
Outgoing Links
| Predicate | Object |
|---|---|
| assignee | http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_89afae566b725ae78e20cf972d9bcdc7 |
| classificationCPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C11D7-5022 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-422 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C11D11-0041 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-42 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C09K13-00 |
| classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-34 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C09K13-06 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-32 |
| filingDate | 2006-07-14-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor | http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_097966b3fc693ecbeab1857138a77079 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_b800b46f1ca77d85db8efe078b92b37b |
| publicationDate | 2008-01-18-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber | KR-20080007355-A |
| titleOfInvention | Cleaning solution for lithography |
| abstract | BACKGROUND OF THE INVENTION Field of the Invention The present invention relates to a lithography cleaning liquid for cleaning and removing unnecessary portions of a resist film formed on a substrate and photoresist remaining in a photoresist supply apparatus when a resist pattern is produced by a lithography technique. As the cleaning liquid, an unnecessary resist can be completely dissolved and removed, and a solvent which can be quickly dried afterwards is used. However, since it is required to have no adverse effect on the resist film after treatment, the component depends on the type of resist used. do. However, no effective cleaning solution is known so far for the photoresist for ArF excimer laser having an acrylic polymer as a component. The present invention provides a lithographic cleaning liquid effective for removing an photoresist for an ArF excimer laser by using an alkoxycarboxylic acid alkyl ester alone or a mixed solvent thereof with alkoxybenzene. |
| priorityDate | 2005-07-28-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
Total number of triples: 53.