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filingDate 2007-07-05-04:00^^<http://www.w3.org/2001/XMLSchema#date>
inventor http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_66bea6de84f6447c532e35d0da8a0e29
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publicationDate 2008-01-10-04:00^^<http://www.w3.org/2001/XMLSchema#date>
publicationNumber KR-20080005094-A
titleOfInvention Silver film formed by electroplating base material
abstract The inventors of the present invention have intensively studied and found that the crystal grain size of the outermost surface of the silver plated layer is in the range of 0.5 [μm] or more and 30 [μm] or less in the visible light region. It was found that a silver film having a high reflectance of about 90 to 99 [%] can be formed.n n n n Metal Strike Alloy, Electroplating
isCitedBy http://rdf.ncbi.nlm.nih.gov/pubchem/patent/KR-20130077811-A
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/KR-20150064096-A
priorityDate 2006-07-06-04:00^^<http://www.w3.org/2001/XMLSchema#date>
type http://data.epo.org/linked-data/def/patent/Publication

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