http://rdf.ncbi.nlm.nih.gov/pubchem/patent/KR-20080001498-A
Outgoing Links
| Predicate | Object |
|---|---|
| assignee | http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_b1007735376d07808ebe297f823b2829 |
| classificationCPCAdditional | http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/B29L2031-3475 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C09K2323-00 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C09K2323-02 |
| classificationCPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G02F1-1303 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-00 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/B29C33-40 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0007 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0017 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G02F1-13394 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/B29C33-3857 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G02F1-136 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-033 |
| classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G02F1-1339 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/B29C43-02 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G02F1-136 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/B29C33-40 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G02B5-20 |
| filingDate | 2006-06-29-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor | http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_db4054cc58f2ff6f96d7feca06bb5223 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_5d289ca70f5c379dcd8580531f1b1438 |
| publicationDate | 2008-01-03-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber | KR-20080001498-A |
| titleOfInvention | Pattern forming resist and soft mold manufacturing method using the same |
| abstract | The present invention relates to a technique that can replace the photolithography technique used in the prior art liquid crystal display device manufacturing method. The pattern forming resist according to the present invention includes a hydrophilic liquid polymer precursor, a photoinitiator and a surfactant, and the pattern is formed by irradiation of a master mold and light in a region corresponding to a predetermined pattern to be formed. In addition, the method for manufacturing a soft mold using the pattern forming resist according to the present invention provides a master mold having a predetermined pattern formed on one surface, and after applying the pattern forming resist on the master mold, And irradiating the pattern forming resist with light to form a soft mold made of a polymer, and then separating the soft mold from the master mold. In the method of manufacturing a flat panel display device using the soft mold, an etch resist is coated on a thin film, pressurized with the soft mold to form an etch resist pattern on the thin film, and then the soft mold is removed from the etch resist pattern. After separation, etching the thin film by using the etch resist pattern to form a thin film pattern.n n n n LCD, Soft Lithography, Pattern Forming Resist, Soft Mold, Master Mold |
| priorityDate | 2006-06-29-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
Total number of triples: 49.