http://rdf.ncbi.nlm.nih.gov/pubchem/patent/KR-20080000669-A
Outgoing Links
Predicate | Object |
---|---|
assignee | http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_89afae566b725ae78e20cf972d9bcdc7 |
classificationCPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0397 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0392 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0045 |
classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-039 |
filingDate | 2006-04-26-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
inventor | http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_13814e23073e22d9eecdc7fb7d640788 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_178e94dab545bde591bc54583473f4c2 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_f0b9fdcd02896bed15c330df43dce53d |
publicationDate | 2008-01-02-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
publicationNumber | KR-20080000669-A |
titleOfInvention | Positive resist composition and method of forming resist pattern |
abstract | As a positive type resist composition containing the base component (A) which alkali solubility increases by the action of an acid, and the acid generator component (B) which generate | occur | produces an acid by exposure, the said base component (A) is two or more. Compound (A1) which has a phenolic hydroxyl group and whose said phenolic hydroxyl group in the polyhydric phenol compound (a) whose molecular weight is 300-2500 is protected by an acid dissociable, dissolution inhibiting group, and the said compound (A1) is And the positive type resist composition having a standard deviation (σ n ) of the number of protections per molecule (pieces) is less than 1, or the standard deviation (σ p ) of the protection rate (mol%) per molecule is less than 16.7. |
priorityDate | 2005-05-17-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
Total number of triples: 236.