| abstract |
The present invention relates to a sulfonate represented by the formula (1).n n n <Formula 1>n n n n n n n n (R 1 is an alkyl group of C1 to C20 or an aryl group of C6 to C15 or a heteroaryl group of C4 to C15, and M + is a lithium ion, sodium ion, potassium ion, ammonium ion or tetramethylammonium ion.)n n n Since the sulfonic acid of the present invention is partially substituted with fluorine in the α and β-positions, it shows not only strong acidity but also easy introduction of various substituents and a wide range of molecular designs. Moreover, these photoacid generators which generate sulfonic acid can be used without any problem in various processes in the device manufacturing process, and also suppress the elution to water at the time of ArF immersion exposure, and there is little influence of the water which remains on a wafer. In addition, since the ester moiety is hydrolyzed under basic conditions, it can be converted into a low molecular weight compound having low molecular weight by treating the resist waste liquid appropriately, and the combustibility at the time of combustion disposal is also high. |