http://rdf.ncbi.nlm.nih.gov/pubchem/patent/KR-20070116665-A
Outgoing Links
| Predicate | Object |
|---|---|
| assignee | http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_5f7f120efe096284c7389702c969cf3d |
| classificationCPCAdditional | http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C03C2218-00 |
| classificationCPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-6715 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-38 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-162 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-168 |
| classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-027 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-16 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-022 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-38 |
| filingDate | 2006-03-29-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor | http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_825ca85505928a3f6ab26c838f1a5b8a http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_877b2bff53faf29fec5f95aa2b66bf7e http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_46b92e74d4a3d675e01dcef4952ef609 |
| publicationDate | 2007-12-10-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber | KR-20070116665-A |
| titleOfInvention | Pattern Formation Method |
| abstract | The process of apply | coating a photosensitive resin composition to a board | substrate, drying, and forming a resin film, the process of heating the board | substrate with a resin film at normal pressure, the process of irradiating a light beam, and forming the latent image of a pattern in the said resin film, and developing it In the pattern formation method which has a process of forming a resin pattern in (1), the said drying is performed under reduced pressure conditions, and (2) Formula [1] of the said photosensitive resin composition:n n n A = (1 / Z) × ln (Y / X)n n n (In formula [1], X is the light transmittance (%) of the laminated body of the resin film of the photosensitive resin composition formed on the quartz glass substrate on predetermined conditions, and a quartz glass substrate, and Y is 6000 mJ /) in the said laminated body. The light transmittance (%) and Z after irradiating 2 cm <2> light are the values A calculated by thickness (micrometer) of the said laminated resin film), The pattern formation method characterized by the above-mentioned. |
| isCitedBy | http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-8811063-B2 |
| priorityDate | 2005-03-30-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
Total number of triples: 171.