http://rdf.ncbi.nlm.nih.gov/pubchem/patent/KR-20070104255-A

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filingDate 2007-04-19-04:00^^<http://www.w3.org/2001/XMLSchema#date>
inventor http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_918fa77202a97c9fcc5c2e106e9800f2
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publicationDate 2007-10-25-04:00^^<http://www.w3.org/2001/XMLSchema#date>
publicationNumber KR-20070104255-A
titleOfInvention Conductive Plasma Member
abstract The present invention is a plasma member exposed to a halogen-based gas plasma atmosphere, wherein a thermal sprayed film of yttrium metal or a thermal sprayed film of yttrium metal and yttrium oxide and / or yttrium fluoride is formed on at least a portion of the substrate exposed to the plasma. The electroconductive plasma member provided with electroconductivity is provided.n n n The corrosion resistant conductive plasma member of the present invention is conductive and improves corrosion resistance to a halogen-based corrosive gas or plasma thereof, and suppresses particle contamination by plasma etching when used in a semiconductor manufacturing apparatus or a flat panel display manufacturing apparatus. can do.n n n Conductive plasma resistant member, halogen-based corrosive gas, flat panel display
isCitedBy http://rdf.ncbi.nlm.nih.gov/pubchem/patent/KR-20180132949-A
priorityDate 2006-04-20-04:00^^<http://www.w3.org/2001/XMLSchema#date>
type http://data.epo.org/linked-data/def/patent/Publication

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