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filingDate 2005-12-07-04:00^^<http://www.w3.org/2001/XMLSchema#date>
inventor http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_64f1e359b6892a619bc36d7a6ae8c94a
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publicationDate 2007-10-12-04:00^^<http://www.w3.org/2001/XMLSchema#date>
publicationNumber KR-20070100887-A
titleOfInvention Treatment of Highly Refined Polyhedral Oligomeric Silsesquioxane Monomers
abstract The present invention relates to a process for the synthesis of polyhedral oligomeric silsesquioxanes for the production of high purity, low resin, solvent free, trace metal free monomers suitable for use in microelectronic applications. POSS silanol is reacted with a silane coupling agent in the presence of a solvent and a superbase.
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type http://data.epo.org/linked-data/def/patent/Publication

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Total number of triples: 31.