| Predicate |
Object |
| assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_81cfb88d909c75104c0c8d61799a72b0 |
| classificationCPCAdditional |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-091 |
| classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-32
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-30
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-34
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-425 |
| classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-32
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-30
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-34 |
| filingDate |
2006-01-09-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_b425676efe1d26c12ce5a315f5de32b2
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_d0348c10f46675dffacf676d198086be
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_3f7e98715e9bbf10ed8bddee62675605
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_408c5c237358db939f26cc511c4b1005
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_fb27548858cc64445dd6ea21d1a212bc |
| publicationDate |
2007-10-08-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber |
KR-20070099012-A |
| titleOfInvention |
Compositions Useful for Removal of Photoresist and Bottom Anti-Reflective Coatings After Etching |
| abstract |
Aqueous compositions and methods are provided for removing such materials from microelectronic devices having cured photoresist and / or bottom antireflective coating (BARC) materials thereon. The aqueous composition comprises at least one disorder causing solute, at least one alkaline base and deionized water. The use of the composition does not adversely affect metal species on the substrate, such as copper, and does not damage low k dielectric materials used in microelectronic device constructions, and cured photoresists and / or in the manufacture of integrated circuits. BARC material can be removed with high efficiency. |
| priorityDate |
2005-01-07-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type |
http://data.epo.org/linked-data/def/patent/Publication |