| abstract |
The present invention relates to a process for producing thin films of organic-inorganic properties, including growing by gas phase technology, preferably by atomic layer chemical vapor deposition (ALCVD). For example, trimethylaluminum (TMA), hydroquinone (Hq) and phloroglucinol (Phl) have been used as precursors for producing thin films of aluminum benzene oxide that make up hybrid type membranes. In addition, thin films of hybrid characteristics are described. These films can be used as optical materials, pressure sensors, gas sensors, temperature sensors, magnetic field sensors, electric field sensors, piezoelectric materials, magnetic materials, semiconductor materials, and electrical insulating materials. |