| abstract |
This invention aims at the improvement of durability of arrangement | positioning members in containers, such as a device for semiconductor processing in which plasma etching process is performed in a strong corrosive environment.n n n 2, which has a porous layer which consists of a thermal spray coating of the periodic table IIIa oxide on the surface of a metallic or nonmetallic base material directly or via a lower coat layer, and forms high energy, such as an electron beam or a laser beam, by irradiation process on the layer. It is a ceramic coating member in which a vehicle recrystallization layer is formed. |