| Predicate |
Object |
| assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_dc3e639586089fe232d0cfb27383c875 |
| classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C23C16-4405
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-205
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01J37-3277
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/B08B7-00
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C23C16-46
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C23C16-545
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01J37-32009
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C23C16-5096 |
| classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-205 |
| filingDate |
2006-05-10-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_af18bd2705e95743310a056ea25aebdd
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_33fdec7179aafbe34c4c344a136eb129
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_05921112cd265904d6c03276a497000f
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_4da215ed301a7d76c1c4ac76d7385a32
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_6db67ab5fb8848c7f1061c257e036e6a
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_391bff71579fcab25826d38bb1224dc5
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_7de76b185709cccfa739cc83e49a91f0
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_1a62852d2e19454cc972dbb01d0f26b0 |
| publicationDate |
2007-09-03-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber |
KR-20070089848-A |
| titleOfInvention |
Winding Plasma CDD Device |
| abstract |
The present invention provides a wound plasma CVD apparatus capable of uniformly supplying the reaction gas to the film film forming area to achieve uniform film quality and performing self cleaning of the film forming part during film film forming.n n n The film 22 is supported between the movable rollers 33 and 34 arranged upstream and downstream of the film forming section 25 with respect to the film traveling direction, and the film 22 runs almost linearly at the film forming position. Let's do it. As a result, the opposing distance between the shower plate 37 and the film 22 is kept constant to achieve uniform film quality. The film 22 is heated by the metal belt 40 running simultaneously on the back side thereof. The movable rollers 33 and 34 are configured to be liftable from the deposition position to the self-cleaning position and to keep the film 22 away from the shower plate 37. Then, the opening of the mask 51 is closed with the shutter 65 to prevent exposure of the cleaning gas and to perform self cleaning during film formation. |
| isCitedBy |
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/WO-2017090934-A1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/WO-2014208943-A1 |
| priorityDate |
2005-05-10-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type |
http://data.epo.org/linked-data/def/patent/Publication |