http://rdf.ncbi.nlm.nih.gov/pubchem/patent/KR-20070089540-A
Outgoing Links
| Predicate | Object |
|---|---|
| assignee | http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_1a492183be65153abfa7dec00d51c816 |
| classificationCPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L29-4236 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L29-66621 |
| classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L29-78 |
| filingDate | 2006-02-28-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor | http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_7d3bb3590a9f8f042d0489a94dafc63c |
| publicationDate | 2007-08-31-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber | KR-20070089540-A |
| titleOfInvention | Method for manufacturing a semiconductor device having a recess gate |
| abstract | The present invention is to provide a method of manufacturing a semiconductor device having a recess gate for preventing the process margin increases when the recess process is performed after the open process, a semiconductor substrate having a cell region and a scribe line region defined Forming a pad layer pattern having the device isolation region open on the substrate; forming a trench for device isolation by etching the semiconductor substrate using the pad layer pattern as an etch mask; and embedding an insulating layer in the device isolation trench Forming a separator, forming a photoresist pattern having a key open region in a scribe region where a cell region and a recess scheduled area are formed on the pad layer pattern, and using the photoresist pattern as an etch mask, the pad layer pattern and the semiconductor Etching a portion of the substrate, removing the photoresist pattern, and etching the pad layer pattern Wherein the semiconductor substrate a second etch to form a recess, the cell region and the scribe line area, and forming a key, the open area, the process margin is secured is effective to secure the time and cost. |
| priorityDate | 2006-02-28-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
| Predicate | Subject |
|---|---|
| isDiscussedBy | http://rdf.ncbi.nlm.nih.gov/pubchem/substance/SID419579069 |
Total number of triples: 13.