| abstract |
In the method for producing a film of the present invention, when the inorganic substrate is formed on the surface of the polymeric substrate by vaporizing a metal after unwinding the polymeric substrate, oxygen gas is introduced and the inorganic compound layer is formed in an organosilicon compound-containing gas excited atmosphere. It is a manufacturing method. According to the manufacturing method of the film of this invention, the film which has high gas barrier property with respect to oxygen gas, water vapor, etc. can be manufactured.n n n n Method for producing film, inorganic compound layer, organosilicon compound |