Predicate |
Object |
assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_89afae566b725ae78e20cf972d9bcdc7 |
classificationCPCAdditional |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/Y10S430-114 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/Y10S430-106 |
classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-039 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0397 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0392 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-004 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0045 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0047 |
classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-004 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-039 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-027 |
filingDate |
2005-09-30-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_6905dfe8fddb653e9dc31517dbe6027b http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_13814e23073e22d9eecdc7fb7d640788 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_f4e9dcc80f99f35112ee865290b52061 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_f0b9fdcd02896bed15c330df43dce53d |
publicationDate |
2007-08-24-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
publicationNumber |
KR-20070084080-A |
titleOfInvention |
Resist Compositions, Resist Pattern Forming Methods and Compounds |
abstract |
This resist composition has two or more phenolic hydroxyl groups, and a part or all of the hydrogen atoms of the said phenolic hydroxyl group in the polyhydric phenol compound (a) whose molecular weight is 300-2500 are represented with the following general formula (p1) or (p2) [Wherein, R 1 and R 2 Each independently represents a branched or cyclic alkyl group, and may contain a hetero atom in its structure; R 3 is a hydrogen atom or a lower alkyl group; n 'is an integer of 1-3.] It is a resist composition containing the compound substituted by at least 1 sort (s) chosen from the group which consists of an acid dissociable, dissolution inhibiting group. |
priorityDate |
2004-10-29-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
type |
http://data.epo.org/linked-data/def/patent/Publication |