| abstract |
A novel stack is provided to improve the operational stability of the thioaluminate-based fluorescent materials used in ac thick film dielectric electroluminescent displays. The novel stack of structures includes a rare earth activated alkaline thioaluminate fluorescent material thin film layer, and an aluminum oxide layer or aluminum oxynitride layer provided in immediate contact with the fluorescent material thin film layer. The invention is particularly applicable to fluorescent materials used in electroluminescent displays employing thick film dielectric layers governed by high temperature processing temperatures to form and activate fluorescent films.n n n Thioaluminate, fluorescent material thin film layer, fluorescence, operation stability, thick film dielectric layer, electroluminescent display |