abstract |
The present invention contains a copolymer of a compound having a structure having an ether bond such as unsaturated carboxylic acid and / or unsaturated carboxylic anhydride, oxetane compound and tetrahydrofuran structure and a 1,2-quinonediazide compound. A radiation sensitive resin composition used for forming a microlens and an interlayer insulating film is provided.n n n n Radiation-sensitive resin composition, interlayer insulating film, microlens |