http://rdf.ncbi.nlm.nih.gov/pubchem/patent/KR-20070037690-A

Outgoing Links

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assignee http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_fcc0b66123940d1b32783569ebfa2d45
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classificationIPCInventive http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-027
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-022
filingDate 2006-10-02-04:00^^<http://www.w3.org/2001/XMLSchema#date>
inventor http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_a50587834fb2591d295e576d00a4e224
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publicationDate 2007-04-06-04:00^^<http://www.w3.org/2001/XMLSchema#date>
publicationNumber KR-20070037690-A
titleOfInvention Formation of radiation-sensitive resin composition and interlayer insulating film and microlens
abstract The present invention contains a copolymer of a compound having a structure having an ether bond such as unsaturated carboxylic acid and / or unsaturated carboxylic anhydride, oxetane compound and tetrahydrofuran structure and a 1,2-quinonediazide compound. A radiation sensitive resin composition used for forming a microlens and an interlayer insulating film is provided.n n n n Radiation-sensitive resin composition, interlayer insulating film, microlens
priorityDate 2005-10-03-04:00^^<http://www.w3.org/2001/XMLSchema#date>
type http://data.epo.org/linked-data/def/patent/Publication

Incoming Links

Predicate Subject
isDiscussedBy http://rdf.ncbi.nlm.nih.gov/pubchem/substance/SID466978019

Total number of triples: 23.