| abstract |
The method for manufacturing a microstructure according to the present invention includes forming a first ionizing radiation decomposing positive resist layer to be exposed by ionizing radiation in a first wavelength range, and forming a second wavelength range on the first positive photosensitive material layer. Forming a second ionizing radiation decomposing positive resist layer to be photosensitized by ionizing radiation and predetermining a second positive photosensitive material layer as an upper layer by a decomposition reaction without decomposition reaction of the first positive photosensitive material layer described above. Forming a pattern, and forming a predetermined pattern on the first positive type photosensitive material layer, which is a lower layer, by decomposing and developing a predetermined region, and performing the above-described steps to form a convex pattern on the substrate. It is characterized by being manufactured.n n n n Ink jet discharge head, ionizing radiation, resist layer, photoresist layer, liquid flow path |