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filingDate 2005-09-29-04:00^^<http://www.w3.org/2001/XMLSchema#date>
inventor http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_204fbd8a9eae75c108e9dd7c7de5278b
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publicationDate 2007-03-12-04:00^^<http://www.w3.org/2001/XMLSchema#date>
publicationNumber KR-20070028517-A
titleOfInvention Manufacturing method of target material for sputtering target
abstract The manufacturing method of the target material of this invention is a method of manufacturing the target material of a sputtering target by the powder metallurgy method, and has a heating process which sinters the to-be-baked material from the one with respect to each to-be-baked material, and the It is preferable that a heating process is a process of heating, conveying the to-be-baked material so that it may spread over two or more adjacent areas set to different temperatures simultaneously with respect to each said to-be-baked material. According to the present invention, in the heating step, since the temperature difference between the two to-be-baked bodies has a temperature difference between both ends at the time of temperature rising, it can be heated sequentially from one side and sintered, so that a so-called long object and a large target material are produced. In this case, sintering occurs sequentially from one side of the to-be-baked body, and shrinkage due to sintering of the to-be-baked body proceeds sequentially, so that the density of the finally obtained target material can be improved, and the density non-uniformity is improved, and the warpage or cracking is performed. Can be prevented.
priorityDate 2004-10-01-04:00^^<http://www.w3.org/2001/XMLSchema#date>
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