http://rdf.ncbi.nlm.nih.gov/pubchem/patent/KR-20070023299-A
Outgoing Links
| Predicate | Object |
|---|---|
| classificationCPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C23C16-52 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C23C16-40 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-0262 |
| classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C23C16-40 |
| filingDate | 2005-08-24-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationDate | 2007-02-28-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber | KR-20070023299-A |
| titleOfInvention | Method for preparing nickel oxide thin film by metal organic chemical vapor deposition using nickel aminoalkoxide precursor |
| abstract | The present invention relates to a method for preparing a nickel oxide thin film by metal organic chemical vapor deposition (MOCVD) using a nickel aminoalkoxide precursor of Formula 1 as a raw material of nickel, according to the method of the present invention. Compared to the conventional metal organic chemical vapor deposition method, a high quality nickel oxide thin film can be obtained under milder process conditions.n n n [Formula 1]n n n n n n n n Wherein m is an integer ranging from 1 to 3, and R 1 , R 2 , R 3 and R 4 are independently C 1 -C 4 linear or branched alkyl groups.n n n n Nickel Oxide Thin Films, MOCVD, Nickel Aminoalkoxides |
| isCitedBy | http://rdf.ncbi.nlm.nih.gov/pubchem/patent/KR-20190046916-A |
| priorityDate | 2005-08-24-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
Total number of triples: 41.