| Predicate |
Object |
| assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_89afae566b725ae78e20cf972d9bcdc7 |
| classificationCPCAdditional |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0046
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C07C2601-14
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08F222-102 |
| classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-032
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08F220-283
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08F20-20
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C07C69-54
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08F8-00
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08F232-08
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0397
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0392 |
| classificationIPCAdditional |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C08F222-10
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-004 |
| classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C08F20-20
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C08F8-00
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C08F232-08
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-039
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-032
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C08F220-28
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C07C69-54 |
| filingDate |
2005-04-05-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_00b457936ac3c94835cf21a95251d266
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_f4e9dcc80f99f35112ee865290b52061
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_104f8a4efa34b5013135a0ce16f7edb5
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_6905dfe8fddb653e9dc31517dbe6027b |
| publicationDate |
2007-01-18-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber |
KR-20070009620-A |
| titleOfInvention |
A high molecular compound, the photoresist composition containing this high molecular compound, and the resist pattern formation method |
| abstract |
In a system of chemically amplified positive resists, a photoresist composition and a resist pattern forming method comprising a polymer compound containing a high resolution and a fine pattern formation having a high resolution and a high resolution fine patterning of alkali solubility before and after exposure are formed. Is provided.n n n This polymer compound is any one substituent selected from an alcoholic hydroxyl group, a carboxyl group, and a phenolic hydroxyl group as alkali-soluble group (i), General formula (1)n n n n n n n n (In formula, A represents the organic group which has a C1-C20 n + 1 valence or more valence, and n represents the integer of 1-4.) The thing protected by the acid dissociable, dissolution inhibiting group (ii) represented by It has a substituent. |
| isCitedBy |
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/KR-101482037-B1 |
| priorityDate |
2004-04-13-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type |
http://data.epo.org/linked-data/def/patent/Publication |