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filingDate 2001-08-30-04:00^^<http://www.w3.org/2001/XMLSchema#date>
inventor http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_fb3b2149e7ce72a2e974f871735c56f6
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publicationDate 2007-01-17-04:00^^<http://www.w3.org/2001/XMLSchema#date>
publicationNumber KR-20070008724-A
titleOfInvention Nitrogen-doped silicon with virtually no oxidation-induced lamination flaws
abstract The present invention relates to a single crystal silicon, ingot or wafer form, wherein the bacones are major intrinsic point defects, are substantially free of oxide deposit defects, and have axisymmetric regions doped with nitrogen to stabilize the oxygen precipitated nucleus therein, and the process of making them. It's about.
priorityDate 2000-09-19-04:00^^<http://www.w3.org/2001/XMLSchema#date>
type http://data.epo.org/linked-data/def/patent/Publication

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