| Predicate |
Object |
| assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_f4b9f8bfeba2ee70e2d25af5fbbd491f
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_f93b617b9fb560a83c8433ca1148d778 |
| classificationCPCAdditional |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C02F2201-002
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C02F2201-46115
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C02F2201-4616 |
| classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C02F1-305 |
| classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C02F1-30 |
| filingDate |
2005-07-07-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_4467e27efd773c8ce7c9ad47ffdc3280
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_4c617f8214a42e96a710ddacbe00b227
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_9f104a27611dd9b874adaa3652c4a19f
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_0ad563c934159f301c6c9ec7bfd4be2c
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_4db15b84f44ecedbe51042ebc3d24187
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_6c80385c92e98043818096445343ff86
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_8f36054996363c71ff664086080841f9
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_7dfde58ac0be093237790f09833254fb
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_366cad861498eafbacfaa4bf1c4764a5 |
| publicationDate |
2007-01-11-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber |
KR-20070006068-A |
| titleOfInvention |
Wastewater Treatment System |
| abstract |
According to the present invention, a drawing window 20 for diffusing and emitting an electron beam provided from the electron accelerator 10 and two sets of nozzles 60 for ejecting waste water in a direction facing each other so that the electron beam of the electron accelerator 10 is incident. In the wastewater treatment apparatus including a reaction tank 70 for reacting the wastewater provided from the nozzle 60, the diaphragm 80 is installed upright between the two sets of nozzles 60 to prevent the wastewater from scattering. ), Which is a basic feature of the technical configuration. |
| isCitedBy |
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/CN-112028169-A |
| priorityDate |
2005-07-07-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type |
http://data.epo.org/linked-data/def/patent/Publication |