http://rdf.ncbi.nlm.nih.gov/pubchem/patent/KR-20070003888-A
Outgoing Links
| Predicate | Object |
|---|---|
| assignee | http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_996bb3be43c030355e9c3515c5fc4f08 |
| classificationCPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C11D11-0047 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-425 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-422 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-426 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-42 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C11D7-5004 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C11D7-34 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C11D7-5022 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C11D3-3956 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C11D7-261 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C11D3-3947 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C11D11-0005 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C11D7-5013 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C11D7-5009 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C11D7-22 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/B82Y40-00 |
| classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-42 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C11D7-34 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C11D7-32 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C11D7-50 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C11D7-26 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C11D7-22 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C11D3-395 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C11D3-39 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C11D11-00 |
| filingDate | 2005-02-11-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor | http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_d62fcbc90ae0d6ef66d3deae95929db8 |
| publicationDate | 2007-01-05-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber | KR-20070003888-A |
| titleOfInvention | Nanoelectronic and Microelectronic Cleaning Compositions |
| abstract | Nanoelectronic and microelectronic cleaning compositions for cleaning nanoelectronic and microelectronic substrates under supercritical fluid state conditions, in particular silicon oxide, sensitive low k or high k dielectrics and copper, tungsten, tantalum, nickel, gold, cobalt, palladium, Nano or microelectronic substrates featuring platinum, chromium, ruthenium, rhodium, iridium, hafnium, titanium, molybdenum, tin and other metallizations, as well as substrates of Al or Al (Cu) metallization and advanced interconnection techniques. Cleaning compositions useful for and improved compatibility with the substrates can be prepared by (1) supercritical fluids at temperatures of 250 ° C. or less and 600 bar (592.2 atm, 8702.3 psi) or less. Critical main fluid, and (2) a) an oxidizing agent and a polar organic solvent selected from the group consisting of amides, sulfones, sulfolenes, selenones and saturated alcohols, and optionally other components. Formulations comprising, b) silicate-free formulations comprising a polar organic solvent, a strongly alkaline base, and optionally other components selected from the group consisting of amides, sulfones, selenones and saturated alcohols, c) non-nucleophilic positively charged counter ions From about 0.05% to 30% by weight of one or more non-ammonium generating strong bases containing from about 0.5 to about 99.95% by weight of one or more corrosion inhibiting solvent compounds having at least two sites capable of complexing with the metal, and optionally other components D) about 0.05 to 20 weight percent of one or more non-ammonium generating non-HF generated fluoride salts, about 5 to about 99.95 weight percent of water, organic solvents, or both water and organic solvents, and optionally other ingredients And (e) about 0.05% to 30% by weight of at least one non-ammonium generating strong base containing non-nucleophilic positive charge counter ions, at least one A nanoelectronic and microelectronic cleaning composition of the present invention provided by a composition comprising a modifier formulation as a secondary fluid selected from formulations comprising from about 5 to about 99.95 weight percent of sterically hindered amide solvent, and optionally comprising other components. Is provided by the nanoelectronic and microelectronic cleaning compositions. |
| isCitedBy | http://rdf.ncbi.nlm.nih.gov/pubchem/patent/KR-101416103-B1 |
| priorityDate | 2004-03-01-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
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