http://rdf.ncbi.nlm.nih.gov/pubchem/patent/KR-20070001340-A

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filingDate 2005-06-29-04:00^^<http://www.w3.org/2001/XMLSchema#date>
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publicationDate 2007-01-04-04:00^^<http://www.w3.org/2001/XMLSchema#date>
publicationNumber KR-20070001340-A
titleOfInvention Chamber insert and substrate processing apparatus including the same
abstract A chamber insert for adjusting gas flow in the chamber and a substrate processing apparatus having the same have a hollow cylindrical body portion which is opened upside down to surround the stage on the side of the stage for supporting the substrate on the upper surface. The first projection extends along the lower end of the body portion in the outer direction of the body portion and the second projection extends from the upper end portion of the body portion in the outer direction of the body portion.
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Total number of triples: 27.