| abstract |
The present invention relates to an etchant for etching molybdenum (Mo), aluminum (Al) and indium-tin-oxide (ITO).n n n The object of the present invention is to improve productivity and reduce the cost of equipment configuration by using a single etchant in each mask process, unlike the conventional etchant in each mask process.n n n The composition of the etchant of the present invention is 40 to 70 wt% phosphoric acid, 3 to 15 wt% nitric acid, 5 to 35 wt% acetic acid, 0.05 to 5 wt% chlorine compound, 0.01 to 5 wt% chlorine stabilizer, 0.01 ˜5 wt% of pH stabilizer and residual water.n n n The effect of the present invention is that by etching with a single etchant, the same equipment and simple process conditions are used, thereby improving productivity and reducing costs. |