| abstract |
The present invention relates to aqueous cleaning compositions used to remove unwanted organic and inorganic residues and contaminants from substrates such as, for example, semiconductor substrates. The cleaning composition comprises about 0.01% to about 40% by weight of a salt selected from guanidinium salts, acetamidinium salts, formamidinium salts, and mixtures thereof; water; And optionally a water soluble organic solvent. The composition according to the invention is free of oxidizing agents and abrasive particles and can remove residues and / or photoresist residues from the substrate and, in particular, of the substrate having silicon-containing BARC. |