Predicate |
Object |
assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_dae64c775f32c43199adbb4389c2c9b3 |
classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0395 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08F212-22 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0397 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0392 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08F212-18 |
classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C08F212-14 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-039 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-027 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C08F12-14 |
filingDate |
2004-12-22-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_bcd7252d848cd52194750192bc6f8aed http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_b89bf1120eb07019f66a388438f3d055 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_e24b20e201bd24933be441916925993f http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_25b0c4601093b36c344eee75f5ff7b67 |
publicationDate |
2006-12-21-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
publicationNumber |
KR-20060132620-A |
titleOfInvention |
High branched polymer and its manufacturing method, and resist composition containing such high branched polymer |
abstract |
The present invention provides a highly branched polymer that is suitable as a polymer material for nanoprocesses based on optical lithography. The high-branched polymer of the present invention is characterized in that an acid-decomposable group such as p-tert-butoxystyrene is bonded to a molecular end of a core formed by living radical polymerization such as chloromethyl styrene. |
priorityDate |
2003-12-22-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
type |
http://data.epo.org/linked-data/def/patent/Publication |