| abstract |
The present invention provides an antireflection film-forming composition having good anti-etching characteristics and antireflection ability (absorption capacity of short wavelength light) with respect to short wavelength light, and having high time stability, and an antireflection film using the same.n n n A composition for forming an antireflection film comprising a siloxane compound having a light absorber and a crosslinking group, wherein the siloxane compound is sealed with a capping group. Thus, by sealing a siloxane compound with a capping machine, time-lapse stability can be improved, without reducing etch resistance and antireflection capability. |