| Predicate |
Object |
| assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_1e8ba6870e42607109689c74072ca5d3 |
| classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C23C16-52
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C23C16-407
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C23C16-45523
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C23C16-46 |
| classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C23C16-00
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C23C16-40 |
| filingDate |
2006-05-29-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_2083d342992ef94225f2be9f572b945a
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_a2ea73a0a7e58051f671532a6c052f7e |
| publicationDate |
2006-12-06-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber |
KR-20060125500-A |
| titleOfInvention |
How to Form Zinc Oxide Film |
| abstract |
Vaporizing a raw material prepared by dissolving dimethylzinc or diethylzinc in an organic solvent and supplying it to a chemical vapor deposition (CVD) apparatus, and simultaneously supplying a gas containing an oxidant gas to the chemical vapor deposition apparatus. A method of forming a zinc oxide film in a film is disclosed. Also disclosed is a method of forming a zinc oxide film on a substrate surface comprising alternately supplying a gas containing a vaporizing gas of dimethylzinc or diethylzinc and an oxidant gas to the CVD apparatus. Provided is a method of forming a zinc oxide film having a very high quality and high purity on the surface of various substrates safely by the CVD method. |
| isCitedBy |
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/KR-100966081-B1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/KR-101466842-B1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/WO-2015023137-A1 |
| priorityDate |
2005-06-01-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type |
http://data.epo.org/linked-data/def/patent/Publication |