http://rdf.ncbi.nlm.nih.gov/pubchem/patent/KR-20060116866-A

Outgoing Links

Predicate Object
assignee http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_994de0e74e58edf232ab67696be5fe90
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_5f7f120efe096284c7389702c969cf3d
classificationCPCInventive http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C23C30-00
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C23C4-10
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C23C4-11
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/F17C1-10
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C23C8-02
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C23C8-18
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C23C8-16
classificationIPCInventive http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C23C30-00
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/F17C1-10
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C23C8-16
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C23C8-02
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C23C8-18
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C23C4-10
filingDate 2005-02-16-04:00^^<http://www.w3.org/2001/XMLSchema#date>
inventor http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_ef0bd8abc1e2d28e1f446c72fd6e6246
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_d1071cfbf13d385bf3b6b6ca56b502b1
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_48de85430487a21ec6948246962d4994
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_f4c203fc9263f644446e0781582f5292
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_eabf0781a71c950ae7526c03896c5004
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_a20f53cb0cddc8d6a65a13fc377044db
publicationDate 2006-11-15-04:00^^<http://www.w3.org/2001/XMLSchema#date>
publicationNumber KR-20060116866-A
titleOfInvention Gas manufacturing equipment, gas supply vessels, and gas for electronic device manufacturing
abstract To prevent contamination of the raw material gas due to the gas production equipment handling the raw material gas and the gas supply container. The surface roughness of the gas contact surface in the highly reactive raw material gas, especially the gas production facility and supply container by fluorinated hydrocarbon, shall be 1 micrometer or less in a center average roughness Ra. It is preferable that an oxidative passivation film such as chromium oxide, aluminum oxide, yttrium oxide, magnesium oxide or the like is formed on the gas contact surface whose surface roughness is controlled.
priorityDate 2004-03-10-04:00^^<http://www.w3.org/2001/XMLSchema#date>
type http://data.epo.org/linked-data/def/patent/Publication

Incoming Links

Predicate Subject
isDiscussedBy http://rdf.ncbi.nlm.nih.gov/pubchem/compound/CID14915
http://rdf.ncbi.nlm.nih.gov/pubchem/substance/SID415834766
http://rdf.ncbi.nlm.nih.gov/pubchem/compound/CID6336543
http://rdf.ncbi.nlm.nih.gov/pubchem/compound/CID154126554
http://rdf.ncbi.nlm.nih.gov/pubchem/compound/CID12767
http://rdf.ncbi.nlm.nih.gov/pubchem/substance/SID426647958
http://rdf.ncbi.nlm.nih.gov/pubchem/substance/SID419521495
http://rdf.ncbi.nlm.nih.gov/pubchem/substance/SID457280508
http://rdf.ncbi.nlm.nih.gov/pubchem/substance/SID411556313
http://rdf.ncbi.nlm.nih.gov/pubchem/anatomy/ANATOMYID9694
http://rdf.ncbi.nlm.nih.gov/pubchem/substance/SID414867697
http://rdf.ncbi.nlm.nih.gov/pubchem/substance/SID449789534
http://rdf.ncbi.nlm.nih.gov/pubchem/substance/SID432003997
http://rdf.ncbi.nlm.nih.gov/pubchem/compound/CID137031
http://rdf.ncbi.nlm.nih.gov/pubchem/compound/CID522689
http://rdf.ncbi.nlm.nih.gov/pubchem/compound/CID139726
http://rdf.ncbi.nlm.nih.gov/pubchem/compound/CID67738
http://rdf.ncbi.nlm.nih.gov/pubchem/substance/SID456171974
http://rdf.ncbi.nlm.nih.gov/pubchem/substance/SID450705782
http://rdf.ncbi.nlm.nih.gov/pubchem/compound/CID9805
http://rdf.ncbi.nlm.nih.gov/pubchem/substance/SID419549582
http://rdf.ncbi.nlm.nih.gov/pubchem/compound/CID69636
http://rdf.ncbi.nlm.nih.gov/pubchem/compound/CID22600934
http://rdf.ncbi.nlm.nih.gov/pubchem/compound/CID12585
http://rdf.ncbi.nlm.nih.gov/pubchem/compound/CID2775851
http://rdf.ncbi.nlm.nih.gov/pubchem/taxonomy/TAXID9694
http://rdf.ncbi.nlm.nih.gov/pubchem/substance/SID415743364
http://rdf.ncbi.nlm.nih.gov/pubchem/compound/CID13550690
http://rdf.ncbi.nlm.nih.gov/pubchem/substance/SID419515980
http://rdf.ncbi.nlm.nih.gov/pubchem/substance/SID411290744
http://rdf.ncbi.nlm.nih.gov/pubchem/substance/SID419558805
http://rdf.ncbi.nlm.nih.gov/pubchem/substance/SID415737917
http://rdf.ncbi.nlm.nih.gov/pubchem/compound/CID171396
http://rdf.ncbi.nlm.nih.gov/pubchem/substance/SID415842286
http://rdf.ncbi.nlm.nih.gov/pubchem/compound/CID8263
http://rdf.ncbi.nlm.nih.gov/pubchem/compound/CID16213786
http://rdf.ncbi.nlm.nih.gov/pubchem/substance/SID419519694
http://rdf.ncbi.nlm.nih.gov/pubchem/compound/CID11212
http://rdf.ncbi.nlm.nih.gov/pubchem/substance/SID419512635
http://rdf.ncbi.nlm.nih.gov/pubchem/compound/CID962
http://rdf.ncbi.nlm.nih.gov/pubchem/substance/SID450641908
http://rdf.ncbi.nlm.nih.gov/pubchem/compound/CID9989226
http://rdf.ncbi.nlm.nih.gov/pubchem/compound/CID8302
http://rdf.ncbi.nlm.nih.gov/pubchem/substance/SID426223290
http://rdf.ncbi.nlm.nih.gov/pubchem/substance/SID419556964
http://rdf.ncbi.nlm.nih.gov/pubchem/compound/CID11638
http://rdf.ncbi.nlm.nih.gov/pubchem/compound/CID8301
http://rdf.ncbi.nlm.nih.gov/pubchem/compound/CID69654
http://rdf.ncbi.nlm.nih.gov/pubchem/substance/SID451268575
http://rdf.ncbi.nlm.nih.gov/pubchem/substance/SID414871580
http://rdf.ncbi.nlm.nih.gov/pubchem/compound/CID16217673
http://rdf.ncbi.nlm.nih.gov/pubchem/substance/SID416187092
http://rdf.ncbi.nlm.nih.gov/pubchem/compound/CID151080
http://rdf.ncbi.nlm.nih.gov/pubchem/substance/SID456979263
http://rdf.ncbi.nlm.nih.gov/pubchem/substance/SID451818717
http://rdf.ncbi.nlm.nih.gov/pubchem/substance/SID419510980

Total number of triples: 84.