| abstract |
The present invention provides an indium oxide-tin oxide powder and a sputtering target using the same, which can be manufactured at low cost, a high density sputtering target can be obtained, and the life of the target can be extended.n n n Indium oxide-tin oxide powder composed mainly of In-Sn oxide, wherein compound oxide In 4 Sn 3 O 12 is not detected by X-ray diffraction, and In 2 O 3 (222) integral diffraction intensity and SnO 2 (110) integral oxide, characterized in that at least, in 2 O 3 in the SnO 2 capacity of 2.3% by weight calculated from the precipitated amount (mass%) of SnO 2 which is obtained from the ratio of the diffraction intensity of indium-tin oxide powder to be. |