http://rdf.ncbi.nlm.nih.gov/pubchem/patent/KR-20060108202-A

Outgoing Links

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assignee http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_717c792fca7cc9c290c9db33e8fe078b
classificationCPCInventive http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/B82B3-00
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classificationIPCInventive http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-00
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-20
filingDate 2005-12-09-04:00^^<http://www.w3.org/2001/XMLSchema#date>
inventor http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_bb43efcb0ef313a1abf54b16a6729196
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_d7213f7b7c3606e6044ff4325532380f
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publicationDate 2006-10-17-04:00^^<http://www.w3.org/2001/XMLSchema#date>
publicationNumber KR-20060108202-A
titleOfInvention Focused deposition patterning method of nanoparticles
abstract The present invention relates to a method for focusing deposition patterning of nanoparticles, comprising: 1) placing a substrate having a nanopattern formed by a photoresist pattern on an electrode of a reactor having a main body grounded and an electrode mounted therein, and then applying a voltage to the electrode. Applying; 2) accumulating charge in the photoresist pattern on the substrate positioned over the electrode; And 3) introducing a charged nanoparticle aerosol into the reactor, leading the nanoparticles to the nanopattern of the substrate located on the electrode and attaching them to the nanopattern intensively. According to the method of the present invention, the nano-scale structure can be uniformly patterned in a reproducibly focused form without generating a noise pattern on the surface of the conductor, semiconductor or non-conductor.
priorityDate 2005-04-12-04:00^^<http://www.w3.org/2001/XMLSchema#date>
type http://data.epo.org/linked-data/def/patent/Publication

Incoming Links

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Total number of triples: 23.