http://rdf.ncbi.nlm.nih.gov/pubchem/patent/KR-20060099658-A

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assignee http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_c16d2144a81bfa32a665dca1e93c3d37
classificationCPCInventive http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/E03C1-298
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classificationIPCInventive http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G02F1-136
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L29-786
filingDate 2005-03-14-04:00^^<http://www.w3.org/2001/XMLSchema#date>
inventor http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_9c9709ada9640bdc97867778b9973934
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_f52f06098c5daf76936df64c7f4415e5
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publicationDate 2006-09-20-04:00^^<http://www.w3.org/2001/XMLSchema#date>
publicationNumber KR-20060099658-A
titleOfInvention Thin Film Transistor, Thin Film Transistor Display Panel and Manufacturing Method Thereof
abstract The present invention relates to a thin film transistor, a thin film transistor array panel and a manufacturing method thereof. First and second electrodes separated from each other are formed on the substrate, and a silicon film in which amorphous and polycrystalline silicon are mixed is laminated by sputtering or chemical vapor deposition, and then the silicon film is patterned to form a semiconductor. A gate insulating film is formed on the semiconductor, a third electrode facing the semiconductor is formed thereon, a protective film is formed on the third, and a pixel electrode is formed thereon. In this manner, a thin film transistor and a thin film transistor array panel including polycrystalline silicon excellent in mobility without injecting impurities separately can be formed.n n n n Organic light emitting member, thin film transistor, polycrystalline silicon, sputtering, chemical vapor deposition
priorityDate 2005-03-14-04:00^^<http://www.w3.org/2001/XMLSchema#date>
type http://data.epo.org/linked-data/def/patent/Publication

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Total number of triples: 27.