| Predicate |
Object |
| assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_1e70c0aeade92d7571d955d3b90ea06e |
| classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08F232-00
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C09D133-14
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0046
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0397
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0382
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08F220-26
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0395
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-027 |
| classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C08F220-26
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C08F220-22
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C08F2-32
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C09D133-14
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C08F10-00
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03C1-492
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C08F232-00
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-039
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-038
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-004
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C08F220-00
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C08F220-10 |
| filingDate |
2004-09-22-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_f405d1896ca588952af538617fa58e67
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_e999b4e3edca3aa9eeefae9d1fefa601
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_cd40232339b072a9a70b1e659a7e7671 |
| publicationDate |
2006-09-05-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber |
KR-20060095975-A |
| titleOfInvention |
Low-polydispersity photoimageable polymers and photoresists and processes for microlithography |
| abstract |
The present invention relates to low polydisperse copolymers useful in photoimaging and photoresist compositions, and to photoforming methods using these compositions. The low polydisperse copolymers of the present invention are prepared by controlled radical polymerization (CRP) techniques such as RAFT (reversible addition segment chain transfer) polymerization. |
| isCitedBy |
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/KR-101446819-B1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-10990009-B2 |
| priorityDate |
2003-09-23-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type |
http://data.epo.org/linked-data/def/patent/Publication |