| abstract |
A thin film pattern formed on the substrate; and an insulating film formed on the thin film pattern and made of a photosensitive resin, wherein the photosensitive resin contains an alkali soluble resin, a quinone diazide compound, a surfactant, and a solvent, (1), a first silicone compound represented by formula (2), and a second silicone compound represented by formula (3), and a method for producing the same.n n n n An insulating film, a photosensitive resin, a surfactant, a build-up method, a slit coating method |