Predicate |
Object |
assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_89afae566b725ae78e20cf972d9bcdc7 |
classificationCPCAdditional |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H05K3-287 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H05K3-4676 |
classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H05K3-287 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0397 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0392 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0045 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H05K3-4676 |
classificationIPCAdditional |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H05K3-28 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H05K1-00 |
classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-039 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-032 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-004 |
filingDate |
2004-11-18-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_a1a7a337755d3c9859430326d748ee52 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_b434b787a15fc3cad0c361c3157dc56f http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_d6db4bf12ffc6a5541574b21332bb719 |
publicationDate |
2006-06-12-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
publicationNumber |
KR-20060064007-A |
titleOfInvention |
Chemically amplified positive photosensitive thermosetting resin composition, method of forming a cured article, and method of manufacturing a functional element |
abstract |
The present invention provides a photosensitive thermosetting resin composition for use in the manufacture of a permanent film, which can form a resin layer which is excellent in fluidity at the time of heat bonding after pattern formation and which is excellent in adhesion and / or encapsulation as well as in adhesion. The composition contains a reaction product of (A) an alkali soluble resin and (C) a crosslinkable polyvinyl ether compound, (B) a compound which generates an acid under irradiation, and (D) an epoxy resin. |
isCitedBy |
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/KR-20110020780-A |
priorityDate |
2003-11-25-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
type |
http://data.epo.org/linked-data/def/patent/Publication |