| Predicate |
Object |
| assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_89afae566b725ae78e20cf972d9bcdc7 |
| classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0045
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0047
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08F220-1808
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08F220-18
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0397
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0392
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08F220-281
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08F220-283
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08F220-282 |
| classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-039
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C08F220-18
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-30
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C08F220-28 |
| filingDate |
2004-08-10-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_29407907a39a844a28ecb90f4f3aa9f9
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_de9c993ed66f82baae6aa97500ecf35e
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_6905dfe8fddb653e9dc31517dbe6027b |
| publicationDate |
2006-06-05-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber |
KR-20060060673-A |
| titleOfInvention |
Resin for Resist, Positive Resist Composition and Resist Pattern Forming Method |
| abstract |
Provided are a positive resist composition having excellent resolution and depth of focus, a resin for resist used in the positive resist composition, and a resist pattern forming method using the positive resist composition. The said resin for resist has a structural unit (a) derived from ((alpha) -lower alkyl) acrylic acid ester as a main component, and this structural unit (a) is derived from ((alpha) -lower alkyl) acrylic acid ester containing an acid dissociable, dissolution inhibiting group. Containing a structural unit (a1) and a lactone-containing monocyclic group, wherein the structural unit (a1) is represented by the following general formula (a1-1) [wherein R is a hydrogen atom or a lower alkyl group and R 11 is a monocyclic aliphatic group; And an acid dissociable, dissolution inhibiting group containing a hydrocarbon group and not containing a polycyclic aliphatic hydrocarbon group. |
| isCitedBy |
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/KR-20130092471-A |
| priorityDate |
2003-08-13-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type |
http://data.epo.org/linked-data/def/patent/Publication |