http://rdf.ncbi.nlm.nih.gov/pubchem/patent/KR-20060049679-A
Outgoing Links
| Predicate | Object |
|---|---|
| assignee | http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_424db9d56b06a23aed410fcf5df652f3 |
| classificationCPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-42 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-32 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-322 |
| classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C03C23-00 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-32 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-42 |
| filingDate | 2005-06-24-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor | http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_ddddaccdf289710274cfa74b079de7c8 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_dfae59e959d199a8d35045973e8bd022 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_234f320334f9a97fe9e39a3fe7148a86 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_2d08bfbb914272a63018aee5ccc2bbb8 |
| publicationDate | 2006-05-19-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber | KR-20060049679-A |
| titleOfInvention | Rinse solution and resist pattern formation method using the same |
| abstract | The present invention provides a rinse liquid used in a lithography process using a resist, a rinse liquid containing a water-soluble polymer, and a resist pattern forming method using the same. According to the present invention, generation and adhesion of resist insoluble components can be prevented in a lithography process using a resist material that is sensitive to various radiations (ultraviolet rays, far ultraviolet rays, vacuum ultraviolet rays, electron beams, X-rays, excimer lasers, etc.). In addition, even when the resist insoluble component adheres, it can be effectively removed. Accordingly, in a lithography process using a resist in the manufacture of semiconductor integrated circuits such as semiconductor LSI, a resist insoluble that may occur on a resist or on a substrate The fall of the yield by the defect resulting from a component can be prevented as much as possible.n n n Rinse solution, resist, water soluble polymer, surfactant |
| isCitedBy | http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-7897325-B2 |
| priorityDate | 2004-06-25-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
Total number of triples: 84.