http://rdf.ncbi.nlm.nih.gov/pubchem/patent/KR-20060049449-A
Outgoing Links
Predicate | Object |
---|---|
assignee | http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_89afae566b725ae78e20cf972d9bcdc7 |
classificationCPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-027 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0392 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0045 |
classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-004 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-039 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-027 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C07C69-736 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-027 |
filingDate | 2005-05-25-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
inventor | http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_2659735b63ca975a440026ec8b41cca4 |
publicationDate | 2006-05-19-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
publicationNumber | KR-20060049449-A |
titleOfInvention | Positive Resist Compositions and Compounds Used Thereof |
abstract | The positive resist composition of the present invention has an acid dissociable, dissolution inhibiting group, a resin component (A) in which alkali solubility is increased by the action of an acid, an acid generator component (B) which generates an acid upon exposure, and the following general It contains compound (C) represented by formula (1):n n n n n n n n (Wherein R 1 and R 3 each independently represent a hydrogen atom, an alkyl group having 1 to 3 carbon atoms, or a cycloalkyl group having 4 to 6 carbon atoms, n is an integer of 1 to 3, and R 1 and R At least one of 3 is a cycloalkyl group having 4 to 6 carbon atoms, R 2 represents an alkyl group having 1 to 3 carbon atoms, and X represents an alkylene group having 4 or 5 carbon atoms). |
priorityDate | 2004-05-31-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
Total number of triples: 198.