| abstract |
Provided are a positive photosensitive composition which is useful for manufacturing semiconductors such as ICs, circuit boards such as liquid crystals and thermal heads, and other manufacturing processes, and has excellent resolution and line-and-space, and a pattern forming method using the same. Provided is a resin (A) having a repeating unit having an increase in solubility in an alkaline developer by the action of an acid, and a pattern forming method using the same. |