| abstract |
The present invention,n n n (A) a resin comprising at least one structural unit selected from the group consisting of (i) structural units of formula 1 and (ii) structural units of formulas 2, 3, 4, and 5; Andn n n (B) acid generatorn n n It provides a chemically amplified positive resist composition comprising a.n n n <Formula 1>n n n n n n n n <Formula 2>n n n n n n n n <Formula 3>n n n n n n n n <Formula 4>n n n n n n n n <Formula 5>n n n n n n n n The present invention further provides novel monomers useful in resist compositions, and methods for such monomers and compositions.n n n Chemically amplified positive resists, photoresists, resist compositions, acid generators |