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filingDate 2005-03-25-04:00^^<http://www.w3.org/2001/XMLSchema#date>
inventor http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_24db241ac47f80e3e9aa8bb6995a79d9
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_388659bf1b3d8ddafd8b88632e2397ad
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publicationDate 2006-05-16-04:00^^<http://www.w3.org/2001/XMLSchema#date>
publicationNumber KR-20060044769-A
titleOfInvention High Density Nanostructure Interconnect
abstract A method and apparatus are disclosed for forming an electrically and / or thermally conducting interconnect in which a first surface and a second surface are in contact with each other via a plurality of nanostructures disposed on at least one of the surfaces. In one embodiment, the first plurality of regions of nanostructures is disposed on a device of an electronic package, such as by way of example a microprocessor. Thereafter, the first plurality of regions are contacted with corresponding second plurality of regions of the nanostructures on the substrate, thereby forming a strong friction bond. In another embodiment, the plurality of nanostructures are disposed on a device such as a microprocessor and then contacted with the substrate. Intermolecular forces result in attractive forces between the molecules of the nanostructures and the molecules of the substrate, thereby creating a bond between the nanostructures and the substrate.n n n n Nanostructure interconnection, friction bonding, nanostructures, intermolecular forces
isCitedBy http://rdf.ncbi.nlm.nih.gov/pubchem/patent/KR-20190080927-A
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/KR-20200037140-A
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/KR-20210128549-A
priorityDate 2004-04-01-04:00^^<http://www.w3.org/2001/XMLSchema#date>
type http://data.epo.org/linked-data/def/patent/Publication

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