| abstract |
A method of forming a capacitor for use in an analog device is provided. The method of forming a capacitor includes forming a dielectric film on a lower conductive layer, forming a protective film on the dielectric film, forming a photoresist pattern defining an alignment key on the protective film, and using the photoresist pattern as an etching mask. Patterning the dielectric film to form an alignment key, removing the photoresist pattern, removing the protective film, and forming an upper conductive layer pattern on the dielectric film.n n n n Capacitor, Alignment Key, Plasma |