| abstract |
The present invention relates to an etchant for chromium etching, more specifically, a) Ceric Ammonium Nitrate (Ce (NH 4 ) 2 (NO 3 ) 6 ), b) nitric acid (HNO 3 ) or perchloric acid (HClO 4 ), c ) Chromium in flat panel displays such as OLEDs, TFT-LCDs, and color filters, including salts containing Fe 3+ , salts containing NO 3 − , or salts containing Cl − , and d) water. It relates to a chromium etching etchant used in a (Cr) film etching process and a pattern forming method of a metal thin film using the same.n n n The etch etchant for chromium etching of the present invention and the pattern forming method of the metal thin film using the same have the effect of reducing the occurrence of residues during chromium etching, improving the inclination angle and having an excellent profile.n n n n Chrome etching etchant, chrome film |