| Predicate |
Object |
| assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_89afae566b725ae78e20cf972d9bcdc7 |
| classificationCPCAdditional |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/Y10S430-111
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/Y10S430-106 |
| classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0397
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-039
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-40 |
| classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-039
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-40
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C08F220-26
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C08F220-18
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-027 |
| filingDate |
2004-07-07-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_efa468b361066689cdf41ee3391659d7
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_617736ba2d8eaeb2820289e96c968f71
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_de9c993ed66f82baae6aa97500ecf35e
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_6905dfe8fddb653e9dc31517dbe6027b |
| publicationDate |
2006-03-24-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber |
KR-20060026955-A |
| titleOfInvention |
Resist composition, laminated body, and resist pattern formation method |
| abstract |
In the shrinkage process of shrinking by a process such as heating after forming a resist pattern, a resist composition capable of forming a good resist pattern is disclosed. Also disclosed is a laminate and a resist pattern forming method using the resist composition. This resist composition contains a resin component (A) in which alkali solubility changes under the action of an acid and an acid generator component (B) which generates an acid upon exposure. The said (A) component contains the structural unit guide | induced from (meth) acrylic acid ester, and shows the glass transition temperature in 120-170 degreeC range. |
| isCitedBy |
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/KR-20160076133-A |
| priorityDate |
2003-07-09-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type |
http://data.epo.org/linked-data/def/patent/Publication |