http://rdf.ncbi.nlm.nih.gov/pubchem/patent/KR-20060019509-A
Outgoing Links
| Predicate | Object |
|---|---|
| assignee | http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_62fdba7df52864f2aeb98ddce78d9a12 |
| classificationCPCAdditional | http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/Y10S430-106 |
| classificationCPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0751 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0382 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-038 |
| classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-038 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-075 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-004 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03C1-73 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F- |
| filingDate | 2004-06-03-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor | http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_ad8c77dd8cf909201119a70b06cc9bc9 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_ea33e86525b840c35439e9b85dfe2299 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_8e51e847932edf960192f7ffa2c901fe http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_3d05720a81e850e02bdc647384be29ef http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_9da4482ec5bc6bff6c17be82b7d85313 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_13cd471f817006a225a7287959e2fe52 |
| publicationDate | 2006-03-03-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber | KR-20060019509-A |
| titleOfInvention | Novel Photosensitive Resin Compositions |
| abstract | A heat resistant negative type photosensitive composition, comprising (a) one or more polybenzoxazole precursor polymers (I), wherein x is an integer from about 10 to about 1000, y is an integer from 0 to about 900 (x + y) is less than about 1000; Ar 1 is a tetravalent aromatic group, a tetravalent heterocyclic group, or mixtures thereof; Ar 2 is a divalent aromatic group which may include silicon, a divalent heteroatomic ring group, a divalent alicyclic group, or a divalent aliphatic group; Ar 3 is a divalent aromatic group, a divalent aliphatic group, a divalent heteroatomic ring group, or mixtures thereof; Ar 4 may be Ar 1 (OH) 2 or Ar 2 ; G is one or more polybenzoxazole precursor polymers (I) which is a monovalent organic group having a carbonyl group, a carbonyloxy group or a sulfonyl group; (b) one or more photo-active compounds (PAGs) that, when irradiated with light, emit acids; (c) one or more latent crosslinkers comprising at least two ˜N— (CH 2 0R) n units (n = 1 or 2 and R is a linear or branched C 1 -C 8 alkyl group); (d) at least one solvent; And (e) at least one dissolution rate modifier, wherein when the latent crosslinker is reactive, the dissolution rate modifier satisfies the condition of not containing carboxylic acid groups. A photosensitive composition is disclosed. |
| isCitedBy | http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-9348229-B2 http://rdf.ncbi.nlm.nih.gov/pubchem/patent/KR-20170088840-A http://rdf.ncbi.nlm.nih.gov/pubchem/patent/KR-20210102782-A |
| priorityDate | 2003-06-06-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
Total number of triples: 403.