http://rdf.ncbi.nlm.nih.gov/pubchem/patent/KR-20060013044-A

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assignee http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_9fddc6b814c1c313f84e5e19bc765316
classificationCPCInventive http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C23C16-513
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classificationIPCInventive http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C23C16-44
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C23C16-40
filingDate 2004-08-05-04:00^^<http://www.w3.org/2001/XMLSchema#date>
inventor http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_17c8a907d7549cfae9848e6740d3c583
publicationDate 2006-02-09-04:00^^<http://www.w3.org/2001/XMLSchema#date>
publicationNumber KR-20060013044-A
titleOfInvention Titanium Oxide Film Manufacturing Method
abstract The present invention relates to a method of forming a titanium oxide film (TiOx) for photocatalyst using chemical vapor deposition. According to the present invention, a substrate is provided in a chamber for chemical vapor deposition, a vaporization gas is injected into a precursor prepared in a bubbler attached to the chamber, the precursor is made into a gaseous state, and the precursor is supplied into the chamber. React to deposit TiOx doped with C and N on the substrate. At this time, the precursor used is characterized in that one selected from tetrakis dimethylamido Titanium (TDMAT), tetrakis diethylamido Titanium (TDEAT), tetrakis ethylmethylamido Titanium (TEMAT). Accordingly, the titanium oxide film is formed by chemical vapor deposition, and at the same time, the titanium oxide film is doped with C and N by an in-situ method to obtain a titanium oxide film having excellent optical activity even in the visible light region.n n n n Photocatalyst, titanium oxide, in-situ, visible light, photoactive
isCitedBy http://rdf.ncbi.nlm.nih.gov/pubchem/patent/KR-100757707-B1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/KR-101154379-B1
priorityDate 2004-08-05-04:00^^<http://www.w3.org/2001/XMLSchema#date>
type http://data.epo.org/linked-data/def/patent/Publication

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Total number of triples: 29.