| abstract |
The present invention relates to an etching solution for etching a multilayer comprising a molybdenum layer (Mo) and an aluminum layer (Al), 50 to 70% by weight of phosphoric acid, 10 to 14% by weight of nitric acid, 3 to 9% by weight of acetic acid, and It is characterized by containing a residual amount of water. This provides an etchant capable of forming a multilayer comprising a molybdenum layer and an aluminum layer into a desired profile without undercut or the like. |