abstract |
This invention relates to compounds of the general formula (I) which are present as free bases with a purity of at least 97 Wt%.n n n n n n n n In the above formula,n n n A is hydrogen or deuterium,n n n R is C 1 - 6 alkyl, C 3 -10 cycloalkyl, or one of the groups (group), each C 1 as selected from phenyl-3-alkoxy, fluorine, chlorine, bromine, iodine, nitro, amino, hydroxy, oxo , Mercapto, or deuterium, and the C atom represented by one asterisk (*) may exist in (R) configuration, in (S) configuration or as a compound thereof.n n n Moreover, this invention relates to the manufacturing method of the high purity compound of general formula (I), and the use of the high purity compound used for manufacture of a medicament. |